Cyclohexasilane
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3D model (JSmol)
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| ECHA InfoCard | 100.245.594 |
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CompTox Dashboard (EPA)
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| Properties | |
| H12Si6 | |
| Molar mass | 180.606 g·mol−1 |
| Appearance | colorless liquid |
| Density | g/cm3 |
| Melting point | 16.5 °C (61.7 °F; 289.6 K) |
| Boiling point | 226 °C (439 °F; 499 K) |
| reacts with water | |
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Infobox references
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Cyclohexasilane is a binary inorganic compound of silicon and hydrogen with the chemical formula Si6H12.[1][2][3]
Synthesis
Reaction of lithium tetrahydroaluminate and hexasilicon dodecachloride:[4][5]
- Si6Cl12 + 3LiAlH4 → Si6H12 + 3LiCl + 3AlCl3
Also, pyrolysis of monosilane and disilane by heating at low pressure followed by fractional distillation.
Physical properties
Cyclohexasilane forms a colorless liquid that reacts with water.
The compound is soluble in ethanol and carbon disulfide.
Uses
Cyclohexasilane is an important precursor for the deposition of silicon layers from liquid silicon inks in the semiconductor industry.[6][7]
References
- ^ Advances in Organometallic Chemistry. Elsevier. 2 October 2003. p. 158. ISBN 978-0-08-049036-6. Retrieved 14 March 2026.
- ^ Amines—Advances in Research and Application: 2013 Edition. ScholarlyEditions. 21 June 2013. p. 307. ISBN 978-1-4816-7257-3. Retrieved 14 March 2026.
- ^ Börner, Armin; Zeidler, Juliana (14 February 2023). The Chemistry of Biology: Basis and Origin of Evolution. Springer Nature. p. 25. ISBN 978-3-662-66521-3. Retrieved 15 March 2026.
- ^ Böhme, Uwe (2020). Inertgastechnik: Arbeiten unter Schutzgas in der Chemie. Berlin; Boston: De Gruyter Oldenbourg. ISBN 978-3-11-062703-9. Retrieved 14 March 2026.
- ^ Chruściel, Jerzy J. (7 March 2022). Silicon-Based Polymers and Materials. Walter de Gruyter GmbH & Co KG. ISBN 978-3-11-064013-7. Retrieved 14 March 2026.
- ^ Guruvenket, Srinivasan; Hoey, Justin M.; Anderson, Kenneth J.; Frohlich, Matthew T.; Sailer, Robert A.; Boudjouk, Philip (31 August 2015). "Aerosol assisted atmospheric pressure chemical vapor deposition of silicon thin films using liquid cyclic hydrosilanes". Thin Solid Films. 589: 465–471. doi:10.1016/j.tsf.2015.05.069. ISSN 0040-6090. OSTI 1245653. Retrieved 13 March 2026.
- ^ Guruvenket, Srinivasan; Hoey, Justin; Anderson, Kenneth; Frohlich, Matt; Strommen, Gregory; Sailer, Robert; Boudjouk, Philip (June 2014). "Atmospheric pressure chemical vapor deposition of silicon thin films using cyclohexasilane". 2014 IEEE 40th Photovoltaic Specialist Conference (PVSC): 3068–3070. doi:10.1109/PVSC.2014.6925583. ISBN 978-1-4799-4398-2.